PCM Glossary Category: P

Small-volume etching batch for design validation.

Light-sensitive polymer mask for defining etch areas.

Transparent patterned film used to expose photoresist.

Another name for photochemical etching.

Step of transferring CAD design to photoresist.

A natural oxide film that can impact etch uniformity if not removed before processing.

Protective oxide layer to prevent corrosion.

Etching only partway through the material for markings, fold lines, or cavities.

Arranging multiple identical or varied parts on a single sheet for etching.

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