PCM Glossary Category: S

Measurement of the texture of an etched surface.

Removal of masking photoresist after etching.

Key advantage: no distortion introduced.

Performing multiple etch cycles at different depths to achieve tiered features.

Layout method to maximize parts per sheet.

Monitoring etching process capability using data analysis.

Common in aerospace, medical, and electronics.

A method of applying etchant via spray nozzles to achieve uniform removal.

Flat rolled material stock.

Targeted etching of specific metals/layers in a stack.

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