C Archives | Switzer

Cusp

The thin ridge/land formed where the top and bottom etch profiles meet in double-sided photochemical etching. In a balanced process the cusp sits at the sheet’s mid-plane. In an unbalanced…

Cupric Chloride

A copper-based etchant often used for copper alloys.

Critical Dimension (CD)

The most important or smallest feature size that must be controlled during etching.

Corrosion Resistance

Property of many etched alloys (e.g., stainless steel, titanium).

Coordinate Measuring Machine (CMM)

Precision measurement tool for dimensional inspection.

Conductor Pattern

Circuit traces or layouts etched onto metals for electronics.

Cleanroom

Controlled environment used for precision processes, including some medical/aerospace photochemical etching.

Cladding

Bonded layers of dissimilar metals, sometimes etched to create selective properties.

Chromium

Metal used in alloys like stainless steel, resistant but etchable with proper chemistry.

Chemical Milling

Broader term for chemical removal of material; includes photochemical etching and large-surface milling.

PCM Glossary Category: C

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